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Sub-20 nm multilayer nanopillar patterning for hybrid SET/CMOS integration: Figs. 1a, 1b and 5

Engelmann, Hans-Jürgen

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{
  "description": "<p>Energy-filtered transmission electron microscopy (EFTEM) images of stacked&nbsp;Si/SiO2/Si nanopillars</p>", 
  "license": "https://creativecommons.org/licenses/by/4.0/legalcode", 
  "@id": "https://doi.org/10.14278/rodare.807", 
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  "identifier": "https://doi.org/10.14278/rodare.807", 
  "datePublished": "2021-02-09", 
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  "creator": [
    {
      "name": "Engelmann, Hans-J\u00fcrgen", 
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  "name": "Sub-20 nm multilayer nanopillar patterning for hybrid SET/CMOS integration:  Figs. 1a, 1b and 5", 
  "contributor": [
    {
      "name": "von Borany, Johannes", 
      "affiliation": "HZDR", 
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Publication date:
February 9, 2021
DOI:
10.14278/rodare.807

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10.14278/rodare.807

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Grants:
European Commission:
  • IONS4SET - Ion-irradiation-induced Si Nanodot Self-Assembly for Hybrid SET-CMOS Technology (688072)
Related identifiers:
Identical to:
https://www.hzdr.de/publications/Publ-32276
Referenced by:
https://www.hzdr.de/publications/Publ-32129
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License (for files):
Creative Commons Attribution 4.0 International

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