February 9, 2021 Figure Open Access

Engelmann, Hans-Jürgen

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      <creatorName>Engelmann, Hans-Jürgen</creatorName>
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  <titles>
    <title>Sub-20 nm multilayer nanopillar patterning for hybrid SET/CMOS integration: Figs. 1a, 1b and 5</title>
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  <publicationYear>2021</publicationYear>
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    <date dateType="Issued">2021-02-09</date>
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  <descriptions>
    <description descriptionType="Abstract">&lt;p&gt;Energy-filtered transmission electron microscopy (EFTEM) images of stacked&amp;nbsp;Si/SiO2/Si nanopillars&lt;/p&gt;</description>
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      <funderName>European Commission</funderName>
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      <awardTitle>Ion-irradiation-induced Si Nanodot Self-Assembly for Hybrid SET-CMOS Technology</awardTitle>
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