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Sub-20 nm multilayer nanopillar patterning for hybrid SET/CMOS integration: Figs. 1a, 1b and 5

Engelmann, Hans-Jürgen


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      <creatorName>Engelmann, Hans-Jürgen</creatorName>
      <givenName>Hans-Jürgen</givenName>
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  <titles>
    <title>Sub-20 nm multilayer nanopillar patterning for hybrid SET/CMOS integration:  Figs. 1a, 1b and 5</title>
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  <publisher>Rodare</publisher>
  <publicationYear>2021</publicationYear>
  <dates>
    <date dateType="Issued">2021-02-09</date>
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  <descriptions>
    <description descriptionType="Abstract">&lt;p&gt;Energy-filtered transmission electron microscopy (EFTEM) images of stacked&amp;nbsp;Si/SiO2/Si nanopillars&lt;/p&gt;</description>
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      <funderName>European Commission</funderName>
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      <awardNumber awardURI="info:eu-repo/grantAgreement/EC/H2020/688072/">688072</awardNumber>
      <awardTitle>Ion-irradiation-induced Si Nanodot Self-Assembly for Hybrid SET-CMOS Technology</awardTitle>
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