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Sub-20 nm multilayer nanopillar patterning for hybrid SET/CMOS integration: Figs. 1a, 1b and 5

Engelmann, Hans-Jürgen

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{
  "title": "Sub-20 nm multilayer nanopillar patterning for hybrid SET/CMOS integration: Figs. 1a, 1b and 5", 
  "author": [
    {
      "family": "Engelmann, Hans-J\u00fcrgen"
    }
  ], 
  "id": "807", 
  "type": "figure", 
  "DOI": "10.14278/rodare.807", 
  "publisher": "Rodare", 
  "issued": {
    "date-parts": [
      [
        2021, 
        2, 
        9
      ]
    ]
  }, 
  "abstract": "<p>Energy-filtered transmission electron microscopy (EFTEM) images of stacked&nbsp;Si/SiO2/Si nanopillars</p>"
}
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Publication date:
February 9, 2021
DOI:
10.14278/rodare.807

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10.14278/rodare.807

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Grants:
European Commission:
  • IONS4SET - Ion-irradiation-induced Si Nanodot Self-Assembly for Hybrid SET-CMOS Technology (688072)
Related identifiers:
Cites:
10.17815/jlsrf-3-159
Identical to:
https://www.hzdr.de/publications/Publ-32276
Referenced by:
10.1016/j.mne.2020.100074, https://www.hzdr.de/publications/Publ-32129
Communities:
License (for files):
Creative Commons Attribution 4.0 International

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Engelmann, Hans-Jürgen. (2021, February 9). Sub-20 nm multilayer nanopillar patterning for hybrid SET/CMOS integration: Figs. 1a, 1b and 5. Rodare. http://doi.org/10.14278/rodare.807
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