Dataset Open Access

High-efficiency phosphorus activation in Ge0.95Sn0.05 enabled by ion implantation and flash lamp annealing with preserved alloy integrity

Godoy Perez, Guillermo Fernando; Rebohle, Lars; Kentsch, Ulrich; Chang, Guo-En; Zhou, Shengqiang; Yu, Ing-Song; Fischer, Inga A.; Berkmann, Fritz; Berencen, Yonder

Origin and excel files used for data processing and visualisation of the different characterisation techniques performed (Raman, RBS, XRD, Hall Effect) of the processed GeSn material.

Files (36.2 MB)
Name Size
Contributions graph.opju
md5:ca3bb48513bde2214d99cda687fea016
131.5 kB Download
Hall Effect.opju
md5:a589fb83079e00f0d5a71835109cffd1
183.8 kB Download
Hall Effect.xlsx
md5:7582aacee57bf8d325853891f6a27116
35.8 kB Download
Raman.opju
md5:06c0f641b878b7b705a672f09d91d62c
865.8 kB Download
RBS.opju
md5:afac9e33e0418345d776245c5667870b
974.4 kB Download
RSM 224.opju
md5:318ede5625b4b48d81ce7c0c4a6d4b54
32.5 MB Download
SIMNRA Fitting.xnra
md5:38d7891104da06d128674ccf56cfdbf6
652.3 kB Download
SRIM.opju
md5:28c04b9aa0257c05f40fedc7ca6df0ed
239.4 kB Download
XRD 004.opju
md5:c22da7dd89c3ed83e008b949e05f2f8b
599.4 kB Download
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