August 3, 2022 Dataset Restricted Access

Echresh, Ahmad; Prucnal, Slawomir; Li, Zichao; Hübner, René; Ganss, Fabian; Steuer, Oliver; Bärwolf, Florian; Jazavandi Ghamsari, Shima; Helm, Manfred; Zhou, Shengqiang; Erbe, Artur; Rebohle, Lars; Georgiev, Yordan

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{
  "sameAs": [
    "https://www.hzdr.de/publications/Publ-34995"
  ], 
  "description": "<p>Accurate control of doping and fabrication of metal contacts on n-type germanium nanowires (GeNWs) with low resistance and linear characteristics remain a major challenge in germanium-based nanoelectronics. Here, we present a combined approach to fabricate Ohmic contacts on n-type-doped GeNWs. Phosphorus (P) implantation followed by millisecond rear-side flash lamp annealing was used to produce highly n-type-doped Ge with an electron concentration in the order of 10^19-10^20 cm^{-3}. Electron beam lithography, inductively coupled plasma reactive ion etching, and nickel (Ni) deposition were used to fabricate GeNW-based devices with symmetric Hall bar configuration, which allows detailed electrical characterization of the NWs. Afterward, rear-side flash lamp annealing was applied to form Ni germanide at the Ni-GeNWs contacts to reduce the Schottky barrier height. The two-probe current-voltage measurements on P-doped GeNWs exhibit linear Ohmic behavior. Also, the size-dependent electrical measurements showed that carrier scattering near the NW surfaces and reduction of the effective NW cross-section dominate the charge transport in the GeNWs.</p>", 
  "@id": "https://doi.org/10.14278/rodare.1824", 
  "url": "https://rodare.hzdr.de/record/1824", 
  "identifier": "https://doi.org/10.14278/rodare.1824", 
  "datePublished": "2022-08-03", 
  "@context": "https://schema.org/", 
  "creator": [
    {
      "@type": "Person", 
      "@id": "https://orcid.org/0000-0002-2708-2718", 
      "affiliation": "HZDR", 
      "name": "Echresh, Ahmad"
    }, 
    {
      "@type": "Person", 
      "@id": "https://orcid.org/0000-0002-4088-6032", 
      "affiliation": "HZDR", 
      "name": "Prucnal, Slawomir"
    }, 
    {
      "@type": "Person", 
      "affiliation": "HZDR", 
      "name": "Li, Zichao"
    }, 
    {
      "@type": "Person", 
      "@id": "https://orcid.org/0000-0002-5200-6928", 
      "affiliation": "HZDR", 
      "name": "H\u00fcbner, Ren\u00e9"
    }, 
    {
      "@type": "Person", 
      "affiliation": "HZDR", 
      "name": "Ganss, Fabian"
    }, 
    {
      "@type": "Person", 
      "affiliation": "HZDR", 
      "name": "Steuer, Oliver"
    }, 
    {
      "@type": "Person", 
      "affiliation": "IHP\u2013Leibniz-Institut f\u00fcr innovative Mikroelektronik, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany", 
      "name": "B\u00e4rwolf, Florian"
    }, 
    {
      "@type": "Person", 
      "affiliation": "HZDR", 
      "name": "Jazavandi Ghamsari, Shima"
    }, 
    {
      "@type": "Person", 
      "affiliation": "HZDR", 
      "name": "Helm, Manfred"
    }, 
    {
      "@type": "Person", 
      "@id": "https://orcid.org/0000-0002-4885-799X", 
      "affiliation": "HZDR", 
      "name": "Zhou, Shengqiang"
    }, 
    {
      "@type": "Person", 
      "@id": "https://orcid.org/0000-0001-6368-8728", 
      "affiliation": "HZDR", 
      "name": "Erbe, Artur"
    }, 
    {
      "@type": "Person", 
      "@id": "https://orcid.org/0000-0002-8066-6392", 
      "affiliation": "HZDR", 
      "name": "Rebohle, Lars"
    }, 
    {
      "@type": "Person", 
      "@id": "https://orcid.org/0000-0002-3146-8031", 
      "affiliation": "HZDR", 
      "name": "Georgiev, Yordan"
    }
  ], 
  "name": "Fabrication of highly n-type-doped germanium nanowires and Ohmic contacts using ion implantation and flash lamp annealing", 
  "@type": "Dataset", 
  "inLanguage": {
    "@type": "Language", 
    "alternateName": "eng", 
    "name": "English"
  }
}