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Fabrication of highly n-type-doped germanium nanowires and Ohmic contacts using ion implantation and flash lamp annealing

Echresh, Ahmad; Prucnal, Slawomir; Li, Zichao; Hübner, René; Ganss, Fabian; Steuer, Oliver; Bärwolf, Florian; Jazavandi Ghamsari, Shima; Helm, Manfred; Zhou, Shengqiang; Erbe, Artur; Rebohle, Lars; Georgiev, Yordan


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{
  "abstract": "<p>Accurate control of doping and fabrication of metal contacts on n-type germanium nanowires (GeNWs) with low resistance and linear characteristics remain a major challenge in germanium-based nanoelectronics. Here, we present a combined approach to fabricate Ohmic contacts on n-type-doped GeNWs. Phosphorus (P) implantation followed by millisecond rear-side flash lamp annealing was used to produce highly n-type-doped Ge with an electron concentration in the order of 10^19-10^20 cm^{-3}. Electron beam lithography, inductively coupled plasma reactive ion etching, and nickel (Ni) deposition were used to fabricate GeNW-based devices with symmetric Hall bar configuration, which allows detailed electrical characterization of the NWs. Afterward, rear-side flash lamp annealing was applied to form Ni germanide at the Ni-GeNWs contacts to reduce the Schottky barrier height. The two-probe current-voltage measurements on P-doped GeNWs exhibit linear Ohmic behavior. Also, the size-dependent electrical measurements showed that carrier scattering near the NW surfaces and reduction of the effective NW cross-section dominate the charge transport in the GeNWs.</p>", 
  "DOI": "10.14278/rodare.1824", 
  "issued": {
    "date-parts": [
      [
        2022, 
        8, 
        3
      ]
    ]
  }, 
  "language": "eng", 
  "publisher": "Rodare", 
  "author": [
    {
      "family": "Echresh, Ahmad"
    }, 
    {
      "family": "Prucnal, Slawomir"
    }, 
    {
      "family": "Li, Zichao"
    }, 
    {
      "family": "H\u00fcbner, Ren\u00e9"
    }, 
    {
      "family": "Ganss, Fabian"
    }, 
    {
      "family": "Steuer, Oliver"
    }, 
    {
      "family": "B\u00e4rwolf, Florian"
    }, 
    {
      "family": "Jazavandi Ghamsari, Shima"
    }, 
    {
      "family": "Helm, Manfred"
    }, 
    {
      "family": "Zhou, Shengqiang"
    }, 
    {
      "family": "Erbe, Artur"
    }, 
    {
      "family": "Rebohle, Lars"
    }, 
    {
      "family": "Georgiev, Yordan"
    }
  ], 
  "type": "dataset", 
  "id": "1824", 
  "title": "Fabrication of highly n-type-doped germanium nanowires and Ohmic contacts using ion implantation and flash lamp annealing"
}
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