Dataset Restricted Access
Echresh, Ahmad;
Prucnal, Slawomir;
Li, Zichao;
Hübner, René;
Ganss, Fabian;
Steuer, Oliver;
Bärwolf, Florian;
Jazavandi Ghamsari, Shima;
Helm, Manfred;
Zhou, Shengqiang;
Erbe, Artur;
Rebohle, Lars;
Georgiev, Yordan
{
"abstract": "<p>Accurate control of doping and fabrication of metal contacts on n-type germanium nanowires (GeNWs) with low resistance and linear characteristics remain a major challenge in germanium-based nanoelectronics. Here, we present a combined approach to fabricate Ohmic contacts on n-type-doped GeNWs. Phosphorus (P) implantation followed by millisecond rear-side flash lamp annealing was used to produce highly n-type-doped Ge with an electron concentration in the order of 10^19-10^20 cm^{-3}. Electron beam lithography, inductively coupled plasma reactive ion etching, and nickel (Ni) deposition were used to fabricate GeNW-based devices with symmetric Hall bar configuration, which allows detailed electrical characterization of the NWs. Afterward, rear-side flash lamp annealing was applied to form Ni germanide at the Ni-GeNWs contacts to reduce the Schottky barrier height. The two-probe current-voltage measurements on P-doped GeNWs exhibit linear Ohmic behavior. Also, the size-dependent electrical measurements showed that carrier scattering near the NW surfaces and reduction of the effective NW cross-section dominate the charge transport in the GeNWs.</p>",
"DOI": "10.14278/rodare.1824",
"issued": {
"date-parts": [
[
2022,
8,
3
]
]
},
"language": "eng",
"publisher": "Rodare",
"author": [
{
"family": "Echresh, Ahmad"
},
{
"family": "Prucnal, Slawomir"
},
{
"family": "Li, Zichao"
},
{
"family": "H\u00fcbner, Ren\u00e9"
},
{
"family": "Ganss, Fabian"
},
{
"family": "Steuer, Oliver"
},
{
"family": "B\u00e4rwolf, Florian"
},
{
"family": "Jazavandi Ghamsari, Shima"
},
{
"family": "Helm, Manfred"
},
{
"family": "Zhou, Shengqiang"
},
{
"family": "Erbe, Artur"
},
{
"family": "Rebohle, Lars"
},
{
"family": "Georgiev, Yordan"
}
],
"type": "dataset",
"id": "1824",
"title": "Fabrication of highly n-type-doped germanium nanowires and Ohmic contacts using ion implantation and flash lamp annealing"
}
| All versions | This version | |
|---|---|---|
| Views | 953 | 953 |
| Downloads | 0 | 0 |
| Data volume | 0 Bytes | 0 Bytes |
| Unique views | 683 | 683 |
| Unique downloads | 0 | 0 |