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Data publication: CMOS-compatible manufacturability of sub-15 nm Si/SiO2/Si nanopillars containing single Si nanodots for single electron transistor applications

von Borany, Johannes; Engelmann, Hans-Jürgen; Heinig, Karl-Heinz; Hlawacek, Gregor; Hübner, René; Klüpfel, Fabian; Möller, Wolfhard; Pourteau, Marie-Line; Rademaker, Guido; Rommel, Mathias; Baier, Leander; Pichler, Peter; Tiron, Raluca


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    <dct:title>Data publication: CMOS-compatible manufacturability of sub-15 nm Si/SiO2/Si nanopillars containing single Si nanodots for single electron transistor applications</dct:title>
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    <dcat:keyword>Ion-beam mixing</dcat:keyword>
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    <dct:description>&lt;p&gt;The data included in the publication are results of SET device simulations, Monte-Carlo simulations of physical processes (ion-beam mixing, phase seepration, Si nanodot formation) and micrographs taken by electron and ion microscopes.&lt;/p&gt;</dct:description>
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von Borany, Johannes, Engelmann, Hans-Jürgen, Heinig, Karl-Heinz, Hlawacek, Gregor, Hübner, René, Klüpfel, Fabian, … Tiron, Raluca. (2022). Data publication: CMOS-compatible manufacturability of sub-15 nm Si/SiO2/Si nanopillars containing single Si nanodots for single electron transistor applications [Data set]. Rodare. http://doi.org/10.14278/rodare.1805

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