Data publication: Significant Resistance Reduction in Modulation-Doped Silicon Nanowires via Aluminum-Induced Acceptor States in SiO2

Ratschinski, I.; Nagarajan, S.; Trommer, J.; Luferau, Andrei; Khan, M. B.; Erbe, Artur; Georgiev, Yordan; Mikolajick, T.; Smith, S. C.; König, D.; Hiller, D.

doi:10.14278/rodare.2716

January 30, 2024 Dataset Open Access

Data publication: Significant Resistance Reduction in Modulation-Doped Silicon Nanowires via Aluminum-Induced Acceptor States in SiO2

Ratschinski, I.; Nagarajan, S.; Trommer, J.; Luferau, Andrei; Khan, M. B.; Erbe, Artur; Georgiev, Yordan; Mikolajick, T.; Smith, S. C.; König, D.; Hiller, D.

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<?xml version='1.0' encoding='utf-8'?>
<rdf:RDF xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:adms="http://www.w3.org/ns/adms#" xmlns:cnt="http://www.w3.org/2011/content#" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:dct="http://purl.org/dc/terms/" xmlns:dctype="http://purl.org/dc/dcmitype/" xmlns:dcat="http://www.w3.org/ns/dcat#" xmlns:duv="http://www.w3.org/ns/duv#" xmlns:foaf="http://xmlns.com/foaf/0.1/" xmlns:frapo="http://purl.org/cerif/frapo/" xmlns:geo="http://www.w3.org/2003/01/geo/wgs84_pos#" xmlns:gsp="http://www.opengis.net/ont/geosparql#" xmlns:locn="http://www.w3.org/ns/locn#" xmlns:org="http://www.w3.org/ns/org#" xmlns:owl="http://www.w3.org/2002/07/owl#" xmlns:prov="http://www.w3.org/ns/prov#" xmlns:rdfs="http://www.w3.org/2000/01/rdf-schema#" xmlns:schema="http://schema.org/" xmlns:skos="http://www.w3.org/2004/02/skos/core#" xmlns:vcard="http://www.w3.org/2006/vcard/ns#" xmlns:wdrs="http://www.w3.org/2007/05/powder-s#">
  <rdf:Description rdf:about="https://doi.org/10.14278/rodare.2716">
    <rdf:type rdf:resource="http://www.w3.org/ns/dcat#Dataset"/>
    <dct:type rdf:resource="http://purl.org/dc/dcmitype/Dataset"/>
    <dct:identifier rdf:datatype="http://www.w3.org/2001/XMLSchema#anyURI">https://doi.org/10.14278/rodare.2716</dct:identifier>
    <foaf:page rdf:resource="https://doi.org/10.14278/rodare.2716"/>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Ratschinski, I.</foaf:name>
        <foaf:givenName>I.</foaf:givenName>
        <foaf:familyName>Ratschinski</foaf:familyName>
        <org:memberOf>
          <foaf:Organization>
            <foaf:name>Institute of Applied Physics (IAP), TU Bergakademie Freiberg, Freiberg, 09599, Germany</foaf:name>
          </foaf:Organization>
        </org:memberOf>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Nagarajan, S.</foaf:name>
        <foaf:givenName>S.</foaf:givenName>
        <foaf:familyName>Nagarajan</foaf:familyName>
        <org:memberOf>
          <foaf:Organization>
            <foaf:name>Nanoelectronic Materials Laboratory gGmbH (NaMLab), Dresden, 01187, Germany</foaf:name>
          </foaf:Organization>
        </org:memberOf>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Trommer, J.</foaf:name>
        <foaf:givenName>J.</foaf:givenName>
        <foaf:familyName>Trommer</foaf:familyName>
        <org:memberOf>
          <foaf:Organization>
            <foaf:name>Nanoelectronic Materials Laboratory gGmbH (NaMLab), Dresden, 01187, Germany</foaf:name>
          </foaf:Organization>
        </org:memberOf>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Luferau, Andrei</foaf:name>
        <foaf:givenName>Andrei</foaf:givenName>
        <foaf:familyName>Luferau</foaf:familyName>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Khan, M. B.</foaf:name>
        <foaf:givenName>M. B.</foaf:givenName>
        <foaf:familyName>Khan</foaf:familyName>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description rdf:about="http://orcid.org/0000-0001-6368-8728">
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Erbe, Artur</foaf:name>
        <foaf:givenName>Artur</foaf:givenName>
        <foaf:familyName>Erbe</foaf:familyName>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description rdf:about="http://orcid.org/0000-0002-3146-8031">
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Georgiev, Yordan</foaf:name>
        <foaf:givenName>Yordan</foaf:givenName>
        <foaf:familyName>Georgiev</foaf:familyName>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Mikolajick, T.</foaf:name>
        <foaf:givenName>T.</foaf:givenName>
        <foaf:familyName>Mikolajick</foaf:familyName>
        <org:memberOf>
          <foaf:Organization>
            <foaf:name>Nanoelectronic Materials Laboratory gGmbH (NaMLab), Dresden, 01187, Germany</foaf:name>
          </foaf:Organization>
        </org:memberOf>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Smith, S. C.</foaf:name>
        <foaf:givenName>S. C.</foaf:givenName>
        <foaf:familyName>Smith</foaf:familyName>
        <org:memberOf>
          <foaf:Organization>
            <foaf:name>Integrated Materials Design Lab (IMDL), Australian National University (ANU), Canberra, ACT 2601, Australia</foaf:name>
          </foaf:Organization>
        </org:memberOf>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>König, D.</foaf:name>
        <foaf:givenName>D.</foaf:givenName>
        <foaf:familyName>König</foaf:familyName>
        <org:memberOf>
          <foaf:Organization>
            <foaf:name>Integrated Materials Design Lab (IMDL), Australian National University (ANU), Canberra, ACT 2601, Australia</foaf:name>
          </foaf:Organization>
        </org:memberOf>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Hiller, D.</foaf:name>
        <foaf:givenName>D.</foaf:givenName>
        <foaf:familyName>Hiller</foaf:familyName>
        <org:memberOf>
          <foaf:Organization>
            <foaf:name>Institute of Applied Physics (IAP), TU Bergakademie Freiberg, Freiberg, 09599, Germany</foaf:name>
          </foaf:Organization>
        </org:memberOf>
      </rdf:Description>
    </dct:creator>
    <dct:title>Data publication: Significant Resistance Reduction in Modulation-Doped Silicon Nanowires via Aluminum-Induced Acceptor States in SiO2</dct:title>
    <dct:publisher>
      <foaf:Agent>
        <foaf:name>Rodare</foaf:name>
      </foaf:Agent>
    </dct:publisher>
    <dct:issued rdf:datatype="http://www.w3.org/2001/XMLSchema#gYear">2024</dct:issued>
    <dcat:keyword>electrical properties</dcat:keyword>
    <dcat:keyword>modulation doping</dcat:keyword>
    <dcat:keyword>resistance</dcat:keyword>
    <dcat:keyword>silicon nanowires</dcat:keyword>
    <dct:issued rdf:datatype="http://www.w3.org/2001/XMLSchema#date">2024-01-30</dct:issued>
    <owl:sameAs rdf:resource="https://rodare.hzdr.de/record/2716"/>
    <adms:identifier>
      <adms:Identifier>
        <skos:notation rdf:datatype="http://www.w3.org/2001/XMLSchema#anyURI">https://rodare.hzdr.de/record/2716</skos:notation>
      </adms:Identifier>
    </adms:identifier>
    <dct:isReferencedBy rdf:resource="https://doi.org/10.1002/pssa.202300068"/>
    <owl:sameAs rdf:resource="https://www.hzdr.de/publications/Publ-38708"/>
    <dct:isReferencedBy rdf:resource="https://www.hzdr.de/publications/Publ-38707"/>
    <dct:isVersionOf rdf:resource="https://doi.org/10.14278/rodare.2715"/>
    <dct:isPartOf rdf:resource="https://rodare.hzdr.de/communities/rodare"/>
    <dct:description>&lt;p&gt;Measured resistance as a function of nanowire (NW) width for different modulation doped Si NWs.&lt;/p&gt;</dct:description>
    <dct:accessRights rdf:resource="http://publications.europa.eu/resource/authority/access-right/PUBLIC"/>
    <dct:accessRights>
      <dct:RightsStatement rdf:about="info:eu-repo/semantics/openAccess">
        <rdfs:label>Open Access</rdfs:label>
      </dct:RightsStatement>
    </dct:accessRights>
    <dcat:distribution>
      <dcat:Distribution>
        <dct:rights>
          <dct:RightsStatement rdf:about="https://creativecommons.org/licenses/by/4.0/legalcode">
            <rdfs:label>Creative Commons Attribution 4.0 International</rdfs:label>
          </dct:RightsStatement>
        </dct:rights>
        <dcat:accessURL rdf:resource="https://doi.org/10.14278/rodare.2716"/>
      </dcat:Distribution>
    </dcat:distribution>
  </rdf:Description>
</rdf:RDF>

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Publication date:

January 30, 2024

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Keyword(s):

electrical properties modulation doping resistance silicon nanowires

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https://www.hzdr.de/publications/Publ-38708

Referenced by:
10.1002/pssa.202300068, https://www.hzdr.de/publications/Publ-38707

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Data publication: Significant Resistance Reduction in Modulation-Doped Silicon Nanowires via Aluminum-Induced Acceptor States in SiO2

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Data publication: Significant Resistance Reduction in Modulation-Doped Silicon Nanowires via Aluminum-Induced Acceptor States in SiO2

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