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Data publication: Significant Resistance Reduction in Modulation-Doped Silicon Nanowires via Aluminum-Induced Acceptor States in SiO2

Ratschinski, I.; Nagarajan, S.; Trommer, J.; Luferau, Andrei; Khan, M. B.; Erbe, Artur; Georgiev, Yordan; Mikolajick, T.; Smith, S. C.; König, D.; Hiller, D.


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{
  "type": "dataset", 
  "id": "2716", 
  "DOI": "10.14278/rodare.2716", 
  "author": [
    {
      "family": "Ratschinski, I."
    }, 
    {
      "family": "Nagarajan, S."
    }, 
    {
      "family": "Trommer, J."
    }, 
    {
      "family": "Luferau, Andrei"
    }, 
    {
      "family": "Khan, M. B."
    }, 
    {
      "family": "Erbe, Artur"
    }, 
    {
      "family": "Georgiev, Yordan"
    }, 
    {
      "family": "Mikolajick, T."
    }, 
    {
      "family": "Smith, S. C."
    }, 
    {
      "family": "K\u00f6nig, D."
    }, 
    {
      "family": "Hiller, D."
    }
  ], 
  "abstract": "<p>Measured resistance as a function of nanowire (NW) width for different modulation doped Si NWs.</p>", 
  "title": "Data publication: Significant Resistance Reduction in Modulation-Doped Silicon Nanowires via Aluminum-Induced Acceptor States in SiO2", 
  "publisher": "Rodare", 
  "issued": {
    "date-parts": [
      [
        2024, 
        1, 
        30
      ]
    ]
  }
}
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