Dataset Open Access

Data publication: Modification of Porous Ultralow‑k Film by Vacuum Ultraviolet Emission

Zotovich, Alexey I.; Zyryanov, Sergey M.; Lopaev, Dmitry V.; Rezvanov, Askar A.; Attallah, Ahmed Gamal; Liedke, Maciej Oskar; Butterling, Maik; Bogdanova, Maria A.; Vishnevskiy, Alexey S.; Seregin, Dmitry S.; Vorotyntsev, Dmitry A. Vorotyntsev; Palov, Alexander P.; Hirschmann, Eric; Wagner, Andreas; Naumov, Sergej; Vorotilov, Konstantin A.; Rakhimova, Tatyana V.; Rakhimov, Alexander T. R.; Baklanov, Mikhail


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  <identifier identifierType="DOI">10.14278/rodare.2076</identifier>
  <creators>
    <creator>
      <creatorName>Zotovich, Alexey I.</creatorName>
      <givenName>Alexey I.</givenName>
      <familyName>Zotovich</familyName>
      <affiliation>Skobeltsyn Insitute of Nuclear Physics, Moscow State University, Moscow 119991, Russian Federation</affiliation>
    </creator>
    <creator>
      <creatorName>Zyryanov, Sergey M.</creatorName>
      <givenName>Sergey M.</givenName>
      <familyName>Zyryanov</familyName>
      <affiliation>kobeltsyn Insitute of Nuclear Physics, Moscow State University, Moscow 119991, Russian Federation</affiliation>
    </creator>
    <creator>
      <creatorName>Lopaev, Dmitry V.</creatorName>
      <givenName>Dmitry V.</givenName>
      <familyName>Lopaev</familyName>
      <affiliation>Skobeltsyn Insitute of Nuclear Physics, Moscow State University, Moscow 119991, Russian Federation</affiliation>
    </creator>
    <creator>
      <creatorName>Rezvanov, Askar A.</creatorName>
      <givenName>Askar A.</givenName>
      <familyName>Rezvanov</familyName>
      <affiliation>Molecular Electronics Research Institute, Zelenograd 124460 Moscow, Russian Federation</affiliation>
    </creator>
    <creator>
      <creatorName>Attallah, Ahmed Gamal</creatorName>
      <givenName>Ahmed Gamal</givenName>
      <familyName>Attallah</familyName>
      <nameIdentifier nameIdentifierScheme="ORCID" schemeURI="http://orcid.org/">0000-0002-7759-0315</nameIdentifier>
    </creator>
    <creator>
      <creatorName>Liedke, Maciej Oskar</creatorName>
      <givenName>Maciej Oskar</givenName>
      <familyName>Liedke</familyName>
      <nameIdentifier nameIdentifierScheme="ORCID" schemeURI="http://orcid.org/">0000-0001-7933-7295</nameIdentifier>
    </creator>
    <creator>
      <creatorName>Butterling, Maik</creatorName>
      <givenName>Maik</givenName>
      <familyName>Butterling</familyName>
      <nameIdentifier nameIdentifierScheme="ORCID" schemeURI="http://orcid.org/">0000-0003-3674-0767</nameIdentifier>
    </creator>
    <creator>
      <creatorName>Bogdanova, Maria A.</creatorName>
      <givenName>Maria A.</givenName>
      <familyName>Bogdanova</familyName>
      <affiliation>Skobeltsyn Insitute of Nuclear Physics, Moscow State University, Moscow 119991, Russian Federation</affiliation>
    </creator>
    <creator>
      <creatorName>Vishnevskiy, Alexey S.</creatorName>
      <givenName>Alexey S.</givenName>
      <familyName>Vishnevskiy</familyName>
      <affiliation>MIREARussian Technological University (RTU MIREA), Moscow 119454, Russian Federation</affiliation>
    </creator>
    <creator>
      <creatorName>Seregin, Dmitry S.</creatorName>
      <givenName>Dmitry S.</givenName>
      <familyName>Seregin</familyName>
      <affiliation>MIREARussian Technological University (RTU MIREA), Moscow 119454, Russian Federation</affiliation>
    </creator>
    <creator>
      <creatorName>Vorotyntsev, Dmitry A. Vorotyntsev</creatorName>
      <givenName>Dmitry A. Vorotyntsev</givenName>
      <familyName>Vorotyntsev</familyName>
      <affiliation>MIREARussian Technological University (RTU MIREA), Moscow 119454, Russian Federation</affiliation>
    </creator>
    <creator>
      <creatorName>Palov, Alexander P.</creatorName>
      <givenName>Alexander P.</givenName>
      <familyName>Palov</familyName>
    </creator>
    <creator>
      <creatorName>Hirschmann, Eric</creatorName>
      <givenName>Eric</givenName>
      <familyName>Hirschmann</familyName>
      <nameIdentifier nameIdentifierScheme="ORCID" schemeURI="http://orcid.org/">0000-0001-5782-9627</nameIdentifier>
    </creator>
    <creator>
      <creatorName>Wagner, Andreas</creatorName>
      <givenName>Andreas</givenName>
      <familyName>Wagner</familyName>
      <nameIdentifier nameIdentifierScheme="ORCID" schemeURI="http://orcid.org/">0000-0001-7575-3961</nameIdentifier>
    </creator>
    <creator>
      <creatorName>Naumov, Sergej</creatorName>
      <givenName>Sergej</givenName>
      <familyName>Naumov</familyName>
      <affiliation>Leibniz Institute of Surface Engineering (IOM), Leipzig 04318, Germany</affiliation>
    </creator>
    <creator>
      <creatorName>Vorotilov, Konstantin A.</creatorName>
      <givenName>Konstantin A.</givenName>
      <familyName>Vorotilov</familyName>
      <affiliation>MIREARussian Technological University (RTU MIREA), Moscow 119454, Russian Federation</affiliation>
    </creator>
    <creator>
      <creatorName>Rakhimova, Tatyana V.</creatorName>
      <givenName>Tatyana V.</givenName>
      <familyName>Rakhimova</familyName>
      <affiliation>Skobeltsyn Insitute of Nuclear Physics, Moscow State University, Moscow 119991, Russian Federation</affiliation>
    </creator>
    <creator>
      <creatorName>Rakhimov, Alexander T. R.</creatorName>
      <givenName>Alexander T. R.</givenName>
      <familyName>Rakhimov</familyName>
      <affiliation>Skobeltsyn Insitute of Nuclear Physics, Moscow State University, Moscow 119991, Russian Federation</affiliation>
    </creator>
    <creator>
      <creatorName>Baklanov, Mikhail</creatorName>
      <givenName>Mikhail</givenName>
      <familyName>Baklanov</familyName>
      <affiliation>European Centre for Knowledge and Technology Transfer (EUROTEX), Brussels 1040, Belgium</affiliation>
    </creator>
  </creators>
  <titles>
    <title>Data publication: Modification of Porous Ultralow‑k Film by Vacuum Ultraviolet Emission</title>
  </titles>
  <publisher>Rodare</publisher>
  <publicationYear>2023</publicationYear>
  <subjects>
    <subject>ultralow-k materials</subject>
    <subject>vacuum ultraviolet emission</subject>
    <subject>porosimetry</subject>
    <subject>positron-annihilation spectroscopy</subject>
    <subject>in situ ellipsometry</subject>
  </subjects>
  <dates>
    <date dateType="Issued">2023-01-11</date>
  </dates>
  <resourceType resourceTypeGeneral="Dataset"/>
  <alternateIdentifiers>
    <alternateIdentifier alternateIdentifierType="url">https://rodare.hzdr.de/record/2076</alternateIdentifier>
  </alternateIdentifiers>
  <relatedIdentifiers>
    <relatedIdentifier relatedIdentifierType="DOI" relationType="IsReferencedBy">10.1021/acsaelm.2c00281</relatedIdentifier>
    <relatedIdentifier relatedIdentifierType="URL" relationType="IsIdenticalTo">https://www.hzdr.de/publications/Publ-36205</relatedIdentifier>
    <relatedIdentifier relatedIdentifierType="URL" relationType="IsReferencedBy">https://www.hzdr.de/publications/Publ-35036</relatedIdentifier>
    <relatedIdentifier relatedIdentifierType="DOI" relationType="IsVersionOf">10.14278/rodare.2075</relatedIdentifier>
    <relatedIdentifier relatedIdentifierType="URL" relationType="IsPartOf">https://rodare.hzdr.de/communities/rodare</relatedIdentifier>
  </relatedIdentifiers>
  <rightsList>
    <rights rightsURI="https://creativecommons.org/licenses/by/4.0/legalcode">Creative Commons Attribution 4.0 International</rights>
    <rights rightsURI="info:eu-repo/semantics/openAccess">Open Access</rights>
  </rightsList>
  <descriptions>
    <description descriptionType="Abstract">&lt;p&gt;Modification of spin-on-deposited porous PMO (periodic mesoporous organosilica) ultralow-k (ULK) SiCOH films (k = 2.33) containing both methyl terminal and methylene bridging groups by vacuum ultraviolet (VUV) emission from Xe plasma is studied. The temporal evolution of chemical composition, internal defects, and morphological properties (pore structure transformation) is studied by using Fourier transform infrared spectroscopy, in situ laser ellipsometry, spectroscopic ellipsometry, ellipsometric porosimetry (EP), positron-annihilation lifetime spectroscopy (PALS), and Doppler broadening positron-annihilation spectroscopy. Application of the different advanced diagnostics allows making conclusions on the dynamics of the chemical composition and pore structure. The time frame of the VUV exposure in the current investigation can be divided into two phases. During the first short phase, film loses almost all of its surface methyl and matrix bridging groups. An increase of material porosity due to removal of methyl groups with simultaneous matrix shrinkage is found by in situ ellipsometry. The removal of bridging bonds leads to an increase of matrix intrinsic porosity. Nevertheless, when the treated material is exposed to the ambient air, the sizes of micro- and mesopores and pores interconnectivity decrease with the VUV exposure time according to PAS and EP data. The last is the result of the additional film shrinkage caused by atmosphere exposure. During the second phase the increase of mesopore size is detected by both EP and PAS. The increase of mesopore size goes all the time as it is expected from in situ ellipsometry, but it is masked by the air exposure.&lt;/p&gt;</description>
  </descriptions>
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