Dataset Closed Access
Estevenon, Paul;
Kaczmarek, Thibault;
Rafiuddin, Mohamed Ruwaid;
Welcomme, Eléonore;
Szenknect, Stéphanie;
Mesbah, Adel;
Moisy, Philippe;
Poinssot, Christophe;
Dacheux, Nicolas
{
"language": "eng",
"id": "328",
"title": "Soft Hydrothermal Synthesis of Hafnon, HfSiO4",
"author": [
{
"family": "Estevenon, Paul"
},
{
"family": "Kaczmarek, Thibault"
},
{
"family": "Rafiuddin, Mohamed Ruwaid"
},
{
"family": "Welcomme, El\u00e9onore"
},
{
"family": "Szenknect, St\u00e9phanie"
},
{
"family": "Mesbah, Adel"
},
{
"family": "Moisy, Philippe"
},
{
"family": "Poinssot, Christophe"
},
{
"family": "Dacheux, Nicolas"
}
],
"issued": {
"date-parts": [
[
2020,
1,
29
]
]
},
"publisher": "Rodare",
"DOI": "10.14278/rodare.328",
"type": "dataset",
"abstract": "<p>The conditions allowing the preparation of single phase HfSiO<sub>4</sub> has been determined through a multiparametric study by varying the concentrations of the reactants, the pH of the reactive media or the temperature and duration of the hydrothermal treatment. HfSiO<sub>4</sub> was prepared through relatively soft conditions (pH ≤ 1.6, C<sub>Si</sub> ≈ C<sub>Hf</sub> ≥<sup> </sup>0.21 mol·L<sup>\u20111</sup>, T ≥ 150°C for t ≥ 24 hours).</p>"
}
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