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Soft Hydrothermal Synthesis of Hafnon, HfSiO4

Estevenon, Paul; Kaczmarek, Thibault; Rafiuddin, Mohamed Ruwaid; Welcomme, Eléonore; Szenknect, Stéphanie; Mesbah, Adel; Moisy, Philippe; Poinssot, Christophe; Dacheux, Nicolas


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{
  "id": "328", 
  "type": "dataset", 
  "title": "Soft Hydrothermal Synthesis of Hafnon, HfSiO4", 
  "DOI": "10.14278/rodare.328", 
  "publisher": "Rodare", 
  "author": [
    {
      "family": "Estevenon, Paul"
    }, 
    {
      "family": "Kaczmarek, Thibault"
    }, 
    {
      "family": "Rafiuddin, Mohamed Ruwaid"
    }, 
    {
      "family": "Welcomme, El\u00e9onore"
    }, 
    {
      "family": "Szenknect, St\u00e9phanie"
    }, 
    {
      "family": "Mesbah, Adel"
    }, 
    {
      "family": "Moisy, Philippe"
    }, 
    {
      "family": "Poinssot, Christophe"
    }, 
    {
      "family": "Dacheux, Nicolas"
    }
  ], 
  "language": "eng", 
  "issued": {
    "date-parts": [
      [
        2020, 
        1, 
        29
      ]
    ]
  }, 
  "abstract": "<p>The conditions allowing the preparation of single phase HfSiO<sub>4</sub> has been determined through a multiparametric study by varying the concentrations of the reactants, the pH of the reactive media or the temperature and duration of the hydrothermal treatment. HfSiO<sub>4</sub> was prepared through relatively soft conditions (pH&nbsp;&le;&nbsp;1.6, C<sub>Si</sub>&nbsp;&asymp;&nbsp;C<sub>Hf</sub> &ge;<sup>&nbsp;</sup>0.21&nbsp;mol&middot;L<sup>\u20111</sup>, T &ge; 150&deg;C for t &ge; 24 hours).</p>"
}
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