Dataset Closed Access
Estevenon, Paul; Kaczmarek, Thibault; Rafiuddin, Mohamed Ruwaid; Welcomme, Eléonore; Szenknect, Stéphanie; Mesbah, Adel; Moisy, Philippe; Poinssot, Christophe; Dacheux, Nicolas
{ "id": "328", "type": "dataset", "title": "Soft Hydrothermal Synthesis of Hafnon, HfSiO4", "DOI": "10.14278/rodare.328", "publisher": "Rodare", "author": [ { "family": "Estevenon, Paul" }, { "family": "Kaczmarek, Thibault" }, { "family": "Rafiuddin, Mohamed Ruwaid" }, { "family": "Welcomme, El\u00e9onore" }, { "family": "Szenknect, St\u00e9phanie" }, { "family": "Mesbah, Adel" }, { "family": "Moisy, Philippe" }, { "family": "Poinssot, Christophe" }, { "family": "Dacheux, Nicolas" } ], "language": "eng", "issued": { "date-parts": [ [ 2020, 1, 29 ] ] }, "abstract": "<p>The conditions allowing the preparation of single phase HfSiO<sub>4</sub> has been determined through a multiparametric study by varying the concentrations of the reactants, the pH of the reactive media or the temperature and duration of the hydrothermal treatment. HfSiO<sub>4</sub> was prepared through relatively soft conditions (pH ≤ 1.6, C<sub>Si</sub> ≈ C<sub>Hf</sub> ≥<sup> </sup>0.21 mol·L<sup>\u20111</sup>, T ≥ 150°C for t ≥ 24 hours).</p>" }
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